2023 Ieee THE 4TH International Conference on Pattern Recognition and Machine Learning (PRML 2023)
Pattern recognition and machine learning are rapidly developing fields that have seen significant advances in theory and application in recent years. With the availability of large datasets, powerful computing resources, and sophisticated algorithms, these techniques have been applied in diverse areas such as computer vision, natural language processing, speech recognition, and robotics.
In particular, deep learning has revolutionized the field of machine learning, with efficient training algorithms, powerful hardware, and open-source software enabling researchers to explore and apply deep learning methods across a variety of domains. However, as these technologies become more widespread, there is increasing emphasis on the ethical implications of machine learning and pattern recognition, such as concerns about privacy, bias, fairness, and accountability.
2023 IEEE the 4th International Conference on Pattern Recognition and Machine Learning (PRML 2023) will take place in Urumqi, China from August 4-6, 2023. The conference will include keynote and invited speeches, special sessions, and paper presentations with oral or poster formats. Scholars and experts from all over the world are invited to submit papers or register as listeners to participate in the conference. For more information, please visit the Call for Papers.
Important Notice: The organizing committee will not ask delegates to provide credit card information for any purpose. The registration will be completed only via the registration system.
Submitted papers will be peer-reviewed by the reviewers or Technical Committee members. The accepted and registered papers (after it is properly presented in the conference) will be published in the PRML 2023 IEEE Conference Proceedings, which will be archived in IEEE Xplore, indexed by Ei Compendex and Scopus.
Some excellent papers may be recommended for reviewing of published in the Journal of Advances in Information Technology (ISSN: 1798-2340; CiteScore: 2.4): indexed by ESCI (Web of Science), Scopus, EBSCO, Google Scholar, CNKI, Crossref, etc.
PRML 2022-ISBN: 978-1-6654-9950-7, IEEE Xplore, Ei Compendex and Scopus indexed; Selected papers published in the Special Issue of Entropy (ISSN 1099-4300): indexed by Scopus, SCIE.
PRML 2021-ISBN: 978-1-6654-4382-1, IEEE Xplore, Ei Compendex and Scopus indexed.
1. BEST PRESENTATION AWARD
One Best Oral/Poster Presentation will be selected from each session.
2. BEST PAPER AWARD
The Conference Committee will select one best paper among all accepted papers to grant Best Paper Award with 1000 CNY per paper as the bonus.
3. BEST STUDENT PAPER AWARD
The Conference Committee will select one best student paper among all accepted papers to grant Best Student Paper Award with 1000CNY per paper as the bonus.